- Large-scale digitisation has led to a number of new possibilities with regard to adaptive and learning based methods in the field of Document Image Analysis and OCR. For ground t...
C. Clausner, Stefan Pletschacher, Apostolos Antona...
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
We describe an algorithm for radial layout of undirected graphs, in which nodes are constrained to concentric circles centered at the origin. Such constraints are typical, e.g., i...
Abstract: The diagram editor generator framework DIAMETA utilizes meta-modelbased language specifications and supports free-hand as well as structured editing. In this paper we pre...
A (k, t)-track layout of a graph G consists of a (proper) vertex t-colouring of G, a total order of each vertex colour class, and a (non-proper) edge k-colouring such that between...