As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
Sciweavers respects the rights of all copyright holders and in this regard, authors are only allowed to share a link to their preprint paper on their own website.
Every contribution is associated with a desciptive image. It is the sole responsibility of the authors to ensure that their posted image is not copyright infringing. This service is compliant with IEEE copyright.