Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Obstacle-avoiding rectilinear Steiner minimal tree (OARSMT) construction is becoming one of the most sought after problems in modern design flow. In this paper we present FOARS, ...
Organizations often need to release microdata without revealing sensitive information. To this scope, data are anonymized and, to assess the quality of the process, various privac...
The main purpose of event-based control, if compared to periodic control, is to minimize data transfer or processing power in networked control systems. Current methods have an (i...
One of the oldest problems in the study of dynamical systems is the calculation of an optimal control. Though the determination of a numerical solution for the general nonconvex o...