This paper describes a new collaboration technology that is based on the support of lightweight, informally structured, opportunistic activities featuring heterogeneous threads of...
David R. Millen, Michael J. Muller, Werner Geyer, ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Bezier curves (BC) are fundamental to a wide range of applications from computer-aided design through to object shape descriptions and surface mapping. Since BC only consider glob...
Ferdous Ahmed Sohel, Laurence S. Dooley, Gour C. K...
Service composition concerns both integration of heterogeneous distributed applications and dynamic selection of services. QoS-aware selection enables a service requester with cer...
Davide Bacciu, Maria Grazia Buscemi, Lusine Mkrtch...
Reflective middleware provides an effective way to support adaptation in distributed systems. However, as distributed systems become increasingly complex, certain drawbacks of the...
Bholanathsingh Surajbali, Geoff Coulson, Phil Gree...