Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
In this paper, we originally propose a multiscale feature extraction method of finger-vein patterns based on curvelets and local interconnection structure neural networks. The cur...
The development of object-oriented software starts from requirements expressed commonly as Use Cases. The requirements are then converted into a conceptual or analysis model. Analy...
For the proper design of energy-efficient error control schemes some insight into channel error patterns is needed. This paper presents bit error and packet loss measurements taken...
In this paper, we analyze impedance matching concepts in passive radio frequency identification (RFID) transponders, which are powered by the incoming RF energy and consist of an...