As technology advances, the metal width is decreasing with the length increasing, making the resistance along the power line increase substantially. Together with the nonlinear sc...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
Existing binaural approaches to speech segregation place an exclusive burden on cues related to the location of sound sources in space. These approaches can achieve excellent perfo...
In computer graphics and geometric modeling, shapes are often represented by triangular meshes. With the advent of laser scanning systems, meshes of extreme complexity are rapidly...
Matthias Eck, Tony DeRose, Tom Duchamp, Hugues Hop...
This paper presents an approach that uses special purpose RBAC constraints to base certain access control decisions on context information. In our approach a context constraint is...