Abstract. We present a new application for graph drawing in the context of graphical model-based system design, where manual placing of graphical items is still state-of-the-practi...
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Data access time becomes the main bottleneck in applications dealing with large-scale graphs. Cache-oblivious layouts, constructed to minimize the geometric mean of arc lengths of ...
Mohammad Khairul Hasan, Sung-Eui Yoon, Kyung-Yong ...
Enabling the user of a graph drawing system to preserve the mental map between two different layouts of a graph is a major problem. In this paper we present methods that smoothly ...
The paper analyzes a diagrammatic reasoning problem that consists in finding a graphical layout which simultaneously satisfies a set of constraints expressed in a formal language a...