1799 search results - page 258 / 360 » Design considerations for MRAM |
119
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DAC
2000
ACM
15 years 9 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
123
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IWCMC
2010
ACM
15 years 9 months ago
2010
ACM
We consider the application of a channel state information (CSI) based multi-user (MU) multiple input multiple output (MIMO) scheme to the downlink of 3GPP Long Term Evolution (LT...
179
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ASPDAC
1999
ACM
15 years 8 months ago
1999
ACM
This paper presents a performance-driven I/O pin routing algorithm with special consideration of wire uniformity. First, a topological routing based on min-cost max-flow algorith...
121
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HICSS
1999
IEEE
15 years 8 months ago
1999
IEEE
Empirical work with "Belvedere," a software environment for the construction of diagrammatic representations of evidential relations, is summarized, leading to the hypot...
136
Voted
ICMCS
1999
IEEE
15 years 8 months ago
1999
IEEE
A variety of digital watermarking applications have emerged recently that require the design of systems for embedding one signal (the "embedded signal" or "watermar...