Legacy applications are still widely spread. If a need to change deployment or update its functionality arises, it becomes difficult to estimate the performance impact of such modi...
Steffen Becker, Michael Hauck, Mircea Trifu, Klaus...
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
—As wireless devices and sensors are increasingly deployed on people, researchers have begun to focus on wireless body-area networks. Applications of wireless body sensor network...
Gang Zhou, Jian Lu, Chieh-Yih Wan, Mark D. Yarvis,...
As the industry moves toward larger-scale chip multiprocessors, the need to parallelize applications grows. High inter-thread communication delays, exacerbated by over-stressed hi...
Ram Rangan, Neil Vachharajani, Adam Stoler, Guilhe...
Despite recent successes, large-scale proof development within proof assistants remains an arcane art that is extremely timeconsuming. We argue that this can be attributed to two ...