This paper addresses the segmentation from an image of entities that have the form of a `network', i.e. the region in the image corresponding to the entity is composed of bran...
Ian H. Jermyn, Josiane Zerubia, Ting Peng, V&eacut...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
A novel method to model and predict the location and orientation of alpha helices in membrane- spanning proteins is presented. It is based on a hidden Markov model (HMM) with an a...
Erik L. L. Sonnhammer, Gunnar von Heijne, Anders K...
Given as input a directed graph on N vertices and a set of source-destination pairs, we study the problem of routing the maximum possible number of source-destination pairs on pat...
Julia Chuzhoy, Venkatesan Guruswami, Sanjeev Khann...
Despite the fact that it provides a potentially useful analytical tool, allowing for the joint modeling of dynamic interdependencies within a group of connected areas, until latel...