Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
We consider routing problems in ad hoc wireless networks modeled as unit graphs in which nodes are points in the plane and two nodes can communicate if the distance between them is...
Prosenjit Bose, Pat Morin, Ivan Stojmenovic, Jorge...
Let G be a connected graph, and let V and V two n-element subsets of its vertex set V (G). Imagine that we place a chip at each element of V and we want to move them into the posi...
Let G be an embedded planar graph whose edges may be curves. The detour between two points, p and q (on edges or vertices) of G, is the ratio between the shortest path in G between...
Adrian Dumitrescu, Annette Ebbers-Baumann, Ansgar ...
We show that asymptotic equivalence, in a strong form, holds between two random graph models with slightly differing edge probabilities under substantially weaker conditions than w...