Abstract. We propose to tackle the optical flow problem by a combination of two recent advances in the computation of dense correspondences, namely the incorporation of image segme...
Michael Bleyer, Christoph Rhemann, Margrit Gelautz
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
This paper describes two algorithms for the real-time segmentation of foreground from background layers in stereo video sequences. Automatic separation of layers from colour/contr...
Vladimir Kolmogorov, Antonio Criminisi, Andrew Bla...
Pattern matching for intelligence organizations is a challenging problem. The data sets are large and noisy, and there is a flexible and constantly changing notion of what consti...
Michael Wolverton, Pauline Berry, Ian W. Harrison,...
Complex social and information network search becomes important with a variety of applications. In the core of these applications, lies a common and critical problem: Given a labe...
Arijit Khan, Nan Li, Xifeng Yan, Ziyu Guan, Supriy...