—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
Using content-specific models to guide information retrieval and extraction can provide richer interfaces to endusers for both understanding the context of news events and navigat...
Earl J. Wagner, Jiahui Liu, Larry Birnbaum, Kennet...
The rapid growth of the Internet has made computer-mediated communication popular and the use of e-negotiation systems (ENS) has attracted great attention from researchers and pra...
Glitches (spurious transitions) are common in electronic circuits. In this paper we present a novel approach to reduce dynamic power in FPGAs by reducing glitches during the routi...
The largeness and the heterogeneity of most graph-modeled datasets in several database application areas make the query process a real challenge because of the lack of a complete ...
Federica Mandreoli, Riccardo Martoglia, Giorgio Vi...