Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
We present an ontology of objects, functions, and generic shape representation that supports form-function reasoning. By reasoning from the mechanical and other functions of object...
Spatial agent models can be used to explore self-organising effects such as pattern growth and segregation. We employ our predator-prey model to study these emergent behaviours in...
Papercraft models can serve as inexpensive prototypes in shape design applications. However, in making the models some geometric detail is necessarily lost, and artificial crease...
Su Xue, Xuejin Chen, Julie Dorsey, Holly Rushmeier
An ideal shape model should be both invariant to global transformations and robust to local distortions. In this paper we present a new shape modeling framework that achieves both...