Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...
We report a new error-aware monocular visual odometry method that only uses vertical lines, such as vertical edges of buildings and poles in urban areas as landmarks. Since vertic...
In this paper we identify the requirements for creating formal descriptions of learning scenarios designed under the European Higher Education Area paradigm, using competences and ...
— – Major research challenges in the next generation of wireless networks include the provisioning of worldwide seamless mobility across heterogeneous wireless networks, the im...
— In this paper, a new meta-method based on the physical nuclear process is presented. This meta-method called Fusion-Fission is applied to the two different class of graph parti...