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ICCAD
2007
IEEE
14 years 4 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
ECCV
2002
Springer
14 years 9 months ago
2002
Springer
Abstract. Quadrature filters are a well known method of low-level computer vision for estimating certain properties of the signal, as there are local amplitude and local phase. How...
ICRA
2008
IEEE
14 years 2 months ago
2008
IEEE
— In this paper a new decoupled imaged-based control scheme is proposed from projection onto a unit sphere. This control scheme is based on moment invariants to 3D rotational mot...
CVPR
1998
IEEE
14 years 8 months ago
1998
IEEE
New representations are developed for 2D IP (implicit polynomial) curves ofarbitrary degree. These representations permit shape recognition and pose estimation with essentially sin...
ICCV
1995
IEEE
13 years 11 months ago
1995
IEEE
The structure-from-motion problem has been extensively studied in the field of computer vision. Yet, the bulk of the existing work assumes that the scene contains only a single m...