Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
We show that the multi-commodity max-flow/min-cut gap for series-parallel graphs can be as bad as 2, matching a recent upper bound [8] for this class, and resolving one side of a ...
We present a new local approximation algorithm for computing MAP and logpartition function for arbitrary exponential family distribution represented by a finite-valued pair-wise ...
The Fermat-Weber center of a planar body Q is a point in the plane from which the average distance to the points in Q is minimal. We first show that for any convex body Q in the ...
Let S be a set of horizontal line segments, or bars, in the plane. We say that G is a bar visibility graph, and S its bar visibility representation, if there exists a one-to-one c...
Alice M. Dean, William Evans, Ellen Gethner, Joshu...