Reliability of nanometer circuits is becoming a major concern in today’s VLSI chip design due to interferences from multiple noise sources as well as radiation-induced soft erro...
Nanometer circuits are becoming increasingly susceptible to soft-errors due to alpha-particle and atmospheric neutron strikes as device scaling reduces node capacitances and suppl...
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
The existing decoupling capacitance optimization approaches meet constraints on input impedance for package. In this paper, we show that using impedance as constraints leads to la...
The effect of shield structures for local wirings of analog integrated circuits on crosstalk is determined by electromagnetic simulation. The crosstalk of parallel wirings is redu...