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ASPDAC
2010
ACM
637views Hardware» more  ASPDAC 2010»
15 years 2 months ago
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
CNSM
2010
15 years 2 months ago
DP+IP = design of efficient backup scheduling
Many industries experience an explosion in digital content. This explosion of electronic documents, along with new regulations and document retention rules, sets new requirements f...
Ludmila Cherkasova, Alex Zhang, Xiaozhou Li
GIS
2010
ACM
15 years 2 months ago
Tolerance geometry: Euclid's first postulate for points and lines with extension
Object representation and reasoning in vector based geographic information systems (GIS) is based on Euclidean geometry. Euclidean geometry is built upon Euclid's first postu...
Gwen Wilke, Andrew U. Frank
ICDM
2010
IEEE
228views Data Mining» more  ICDM 2010»
15 years 2 months ago
Multi-label Feature Selection for Graph Classification
Nowadays, the classification of graph data has become an important and active research topic in the last decade, which has a wide variety of real world applications, e.g. drug acti...
Xiangnan Kong, Philip S. Yu
VRST
2010
ACM
15 years 2 months ago
An adaptive training-free feature tracker for mobile phones
While tracking technologies based on fiducial markers have dominated the development of Augmented Reality (AR) applications for almost a decade, various real-time capable approach...
Jan Herling, Wolfgang Broll
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