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ISPD
2010
ACM
14 years 4 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
FOCS
2009
IEEE
14 years 4 months ago
2009
IEEE
In this paper, we set forth a new algorithm for generating approximately uniformly random spanning trees in undirected graphs. We show how to sample from a distribution that is wi...
SIGMETRICS
2005
ACM
14 years 3 months ago
2005
ACM
—To model P2P networks that are commonly faced with high rates of churn and random departure decisions by end-users, this paper investigates the resilience of random graphs to li...
SAMOS
2004
Springer
14 years 3 months ago
2004
Springer
In this paper we present a new approach for generating high-speed optimized event-driven register transfer level (RTL) compiled simulators. The generation of the simulators is part...
EJC
2008
13 years 10 months ago
2008
Abstract. Classes of graphs with bounded expansion are a generalization of both proper minor closed classes and degree bounded classes. Such classes are based on a new invariant, t...