We consider the problem of planar object registration on binary images where the aligning transformation is restricted to the group of affine transformations. Previous approaches...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
— In this paper, we study the problem of distributed detection in the presence of unknown carrier frequency offset (CFO) and initial phase, the issue we encounter in the emerging...
—With single-carrier frequency-domain equalization (SC-FDE), the carrier-frequency offset (CFO) and samplingfrequency offset (SFO) are embedded in the phase rotations of the comp...
A hierarchical scheme with cells and modules is crucial for managing design complexity during a large integrated circuit design. We present a methodology for thermal aware cell-ba...