In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Most graph layout algorithms treat nodes as points. The problem of node overlap removal is to adjust the layout generated by such methods so that nodes of non-zero width and height...
Programs often have a lot of duplicated code, which makes both understanding and maintenance more difficult. This problem can be alleviated by detecting duplicated code, extracting...
We address the problem of message ordering for reliable multicast communication. End-to-end multicast ordering is useful for ensuring the collective integrity and consistency of d...
This paper presents an efficient approach to generate tests for gate delay faults. Unlike other known algorithms which try to generate a 'good' delay test the presented ...