11 search results - page 2 / 3 » Pattern sensitive placement for manufacturability |
ASPDAC
2005
ACM
14 years 1 months ago
2005
ACM
— Sub-resolution assist features (SRAFs) provide an absolutely essential technique for critical dimension (CD) control and process window enhancement in subwavelength lithography...
PICS
2001
13 years 9 months ago
2001
Printer manufacturers design print heads and halftone patterns to result in specific types of image characteristics. Many image quality artifacts are a result of differences in ac...
SECON
2007
IEEE
14 years 1 months ago
2007
IEEE
— In this paper we present empirical results from a study examining the effects of antenna diversity and placement on vehicle-to-vehicle link performance in vehicular ad hoc netw...
KDD
1998
ACM
13 years 11 months ago
1998
ACM
Many data mining tasks (e.g., Association Rules, Sequential Patterns) use complex pointer-based data structures (e.g., hash trees) that typically suffer from sub-optimal data loca...
ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
Abstract—Lithographic limitations and manufacturing uncertainties are resulting in fabricated shapes on wafer that are topologically equivalent, but geometrically different from ...