62 search results - page 7 / 13 » Polish parsers, step by step |
ACL
2006
13 years 8 months ago
2006
This article describes a robust semantic parser that uses a broad knowledge base created by interconnecting three major resources: FrameNet, VerbNet and PropBank. The FrameNet cor...
ISVLSI
2007
IEEE
14 years 1 months ago
2007
IEEE
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
BMCBI
2007
13 years 7 months ago
2007
Background: Microarrays have been used extensively to analyze the expression profiles for thousands of genes in parallel. Most of the widely used methods for analyzing Affymetrix ...
ACL
2012
11 years 9 months ago
2012
We present a novel algorithm for multilingual dependency parsing that uses annotations from a diverse set of source languages to parse a new unannotated language. Our motivation i...
ICCAD
2006
IEEE
14 years 4 months ago
2006
IEEE
Shallow trench isolation (STI) is the mainstream CMOS isolation technology. It uses chemical mechanical planarization (CMP) to remove excess of deposited oxide and attain a planar...