Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Abstract-- Security issues and attack management in transparent WDM (Wavelength Division Multiplexing) optical networks has become of prime importance to network operators due to t...
Effective spectrum sensing is a critical prerequisite for multi-channel cognitive radio (CR) networks, where multiple spectrum bands are sensed to identify transmission opportuniti...
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