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TCAD
2010
88views more  TCAD 2010»
13 years 5 months ago
Stress Aware Layout Optimization Leveraging Active Area Dependent Mobility Enhancement
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan
TCAD
2010
194views more  TCAD 2010»
13 years 5 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
TON
2010
210views more  TON 2010»
13 years 5 months ago
A New Approach to Optical Networks Security: Attack-Aware Routing and Wavelength Assignment
Abstract-- Security issues and attack management in transparent WDM (Wavelength Division Multiplexing) optical networks has become of prime importance to network operators due to t...
Nina Skorin-Kapov, J. Chen, Lena Wosinska
TSP
2010
13 years 5 months ago
Sequential and cooperative sensing for multi-channel cognitive radios
Effective spectrum sensing is a critical prerequisite for multi-channel cognitive radio (CR) networks, where multiple spectrum bands are sensed to identify transmission opportuniti...
Seung-Jun Kim, Georgios B. Giannakis
LR
2011
156views more  LR 2011»
13 years 5 months ago
The assessment of competitive intensity in logistics markets
Scopus is the world’s largest abstract and citation database of peer-reviewed literature and quality web sources (-> http://www.info.sciverse.com/scopus). ontains 41 million r...
Peter Klaus
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