Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
— This article presents a control architecture for controlling the locomotion of an amphibious snake/lamprey robot capable of swimming and serpentine locomotion. The control arch...
The problem of controlling locomotion is an area in which neuroscience and robotics can fruitfully interact. In this article, I will review research carried out on locomotor centr...
Fault Abstraction and Collapsing Framework for Asynchronous Circuits Philip P. Shirvani, Subhasish Mitra Center for Reliable Computing Stanford University Stanford, CA Jo C. Eberge...
Philip P. Shirvani, Subhasish Mitra, Jo C. Ebergen...
The neocortex has a remarkably uniform neuronal organization, suggesting that common principles of processing are employed throughout its extent. In particular, the patterns of co...
Ueli Rutishauser, Rodney J. Douglas, Jean-Jacques ...