295 search results - page 38 / 59 » Simultaneous Quantifier Elimination |
EUROSYS
2009
ACM
14 years 5 months ago
2009
ACM
In a Multi-Variant Execution Environment (MVEE), several slightly different versions of the same program are executed in lockstep. While this is done, a monitor compares the behav...
ISPD
2010
ACM
14 years 3 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
AINA
2008
IEEE
14 years 3 months ago
2008
IEEE
This paper is a contribution to the inception of multiple tokens in solving distributed mutual exclusion problem. The proposed algorithm is based on the token ring approach and al...
ICASSP
2008
IEEE
14 years 3 months ago
2008
IEEE
We address the design and optimization of an energy-efficient lifting-based 2D transform for wireless sensor networks with irregular spatial sampling. The 2D transform is designe...
SMI
2008
IEEE
14 years 3 months ago
2008
IEEE
Hierarchies of patterns of features, of sub-assemblies, or of CSG sub-expressions are used in architectural and mechanical CAD to eliminate laborious repetitions from the design p...