The measure dep-degree is a simple indicator for structural problems and complex dependencies on code-level. We model low-level dependencies between program operations as use-def ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Abstract. We propose a static analysis framework for concurrent programs based on reduction of thread interleavings using sound invariants on the top of partial order techniques. S...
Object-oriented programs often require large heaps to run properly or meet performance goals. They use high-overhead collections, bulky data models, and large caches. Discovering t...
Battery lifetime, a primary design constraint for mobile embedded systems, has been shown to depend heavily on the load current profile. This paper explores how scheduling guidel...
V. Rao, N. Navet, G. Singhal, A. Kumar, G. S. Visw...