Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
We present a new algorithm that enables a convex shaped robot to explore an unknown planar workspace, i.e., an unknown configuration space diffeomorphic to SE(2). This new algor...
We introduce an algorithm that embeds a given 3-connected planar graph as a convex 3-polytope with integer coordinates. The size of the coordinates is bounded by O(27.55n ) = O(18...
A nonplanar graph G is near-planar if it contains an edge e such that G − e is planar. The problem of determining the crossing number of a near-planar graph is exhibited from di...
The coefficient of fragmentability of a class of graphs measures the proportion of vertices that need to be removed from the graphs in the class in order to leave behind bounded s...