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TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
WICOMM
2011
13 years 2 months ago
A pragmatic approach to area coverage in hybrid wireless sensor networks
Success of Wireless Sensor Networks (WSN) largely depends on whether the deployed network can provide desired area coverage with acceptable network lifetime. This paper seeks to a...
Nadeem Ahmed, Salil S. Kanhere, Sanjay Jha