Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Success of Wireless Sensor Networks (WSN) largely depends on whether the deployed network can provide desired area coverage with acceptable network lifetime. This paper seeks to a...