Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
The goal of coverage path planning is to determine a path that passes a detector over all points in an environment. This work prescribes a provably complete coverage path planner ...
Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...
Many instances of NP-hard problems can be solved efficiently if the treewidth of their corresponding graph is small. Finding the optimal tree decompositions is an NP-hard problem a...
This paper presents new algorithms for computing single source shortest paths (SSSPs) in a nearly acyclic directed graph G. The first part introduces higher-order decomposition. ...