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» Unifying Two Graph Decompositions with Modular Decomposition
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TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
IJRR
2002
126views more  IJRR 2002»
13 years 7 months ago
Sensor-based Coverage of Unknown Environments
The goal of coverage path planning is to determine a path that passes a detector over all points in an environment. This work prescribes a provably complete coverage path planner ...
Ercan U. Acar, Howie Choset
ICCAD
2009
IEEE
151views Hardware» more  ICCAD 2009»
13 years 5 months ago
GREMA: Graph reduction based efficient mask assignment for double patterning technology
Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...
Yue Xu, Chris Chu
EVOW
2007
Springer
14 years 1 months ago
Generation of Tree Decompositions by Iterated Local Search
Many instances of NP-hard problems can be solved efficiently if the treewidth of their corresponding graph is small. Finding the optimal tree decompositions is an NP-hard problem a...
Nysret Musliu
ACSC
2007
IEEE
14 years 1 months ago
Improved Shortest Path Algorithms For Nearly Acyclic Directed Graphs
This paper presents new algorithms for computing single source shortest paths (SSSPs) in a nearly acyclic directed graph G. The first part introduces higher-order decomposition. ...
Lin Tian, Tadao Takaoka