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DAC
2000
ACM
13 years 11 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
CORR
2004
Springer
111views Education» more  CORR 2004»
13 years 6 months ago
Layout of Graphs with Bounded Tree-Width
A queue layout of a graph consists of a total order of the vertices, and a partition of the edges into queues, such that no two edges in the same queue are nested. The minimum numb...
Vida Dujmovic, Pat Morin, David R. Wood
IV
2003
IEEE
91views Visualization» more  IV 2003»
13 years 12 months ago
Labeled Radial Drawing of Data Structures
This paper describes a radial layout method for displaying B+ -tree data structures. We present an algorithmic framework for computing the node positions that result in a planar d...
M. Bernard, S. Mohammed
SIGGRAPH
2010
ACM
13 years 11 months ago
Popup: automatic paper architectures from 3D models
Paper architectures are 3D paper buildings created by folding and cutting. The creation process of paper architecture is often laborintensive and highly skill-demanding, even with...
Xian-Ying Li, Chao-Hui Shen, Shi-Sheng Huang, Tao ...
PDP
2005
IEEE
14 years 8 days ago
Practicable Layouts for Optimal Circulant Graphs
Circulant graphs have been deeply studied in technical literature. Midimew networks are a class of distancerelated optimal circulant graphs of degree four which have applications ...
Enrique Vallejo, Ramón Beivide, Carmen Mart...