As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
Abstract. Recently, a trend towards business processes in Business-toBusiness e-Commerce (B2B) is apparent. One of the most promising approaches is UN/CEFACT’s modeling methodolo...
Birgit Hofreiter, Christian Huemer, Werner Winiwar...
In this paper, we present an enhanced Pictorial Struc-
ture (PS) model for precise eye localization, a fundamen-
tal problem involved in many face processing tasks. PS is
a comp...
Xiaoyang Tan (Nanjing University of Aeronautics an...
This paper compares two methods for object localization from contours: shape context and chamfer matching of templates. In the light of our experiments, we suggest improvements to...
Arasanathan Thayananthan, Bjoern Stenger, Philip H...
Shape symmetry is an important cue for image understanding. In the absence of more detailed prior shape information, segmentation can be significantly facilitated by symmetry. How...