259 search results - page 37 / 52 » Workflow Exception Patterns |
ISVC
2007
Springer
14 years 2 months ago
2007
Springer
This paper presents a technique that allows test engineers to visually analyze and explore within memory chip test data. We represent the test results from a generation of chips al...
PUC
2002
13 years 8 months ago
2002
: A Swedish sample of 36 people judged the similarities of 20 objects, primarily information appliance products and services sometimes called consumer electronics, but also some co...
IJRR
2010
13 years 3 months ago
2010
This paper is concerned with the problem of estimating the relative translation and orientation of an inertial measurement unit and a camera, which are rigidly connected. The key ...
ISVLSI
2007
IEEE
14 years 2 months ago
2007
IEEE
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
JOCN
2011
13 years 3 months ago
2011
■ Several studies report a right hemisphere advantage for visuospatial integration and a left hemisphere advantage for inferring conceptual knowledge from patterns of covariatio...