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114
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DAC
2000
ACM
15 years 8 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
142
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DAC
1997
ACM
15 years 8 months ago
1997
ACM
This paper examines the problem of statically analyzing the performance of embedded software. This problem is motivated by the increasing growth of embedded systems and a lack of ...
138
Voted
DAC
1997
ACM
15 years 8 months ago
1997
ACM
The biggest obstacle in the formal verification of large designs is their very large state spaces, which cannot be handled even by techniques such as implicit state space travers...
123
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DAC
1997
ACM
15 years 8 months ago
1997
ACM
A number of industry trends are shaping the requirements for IC and electronic equipment design. The density and complexity of circuit technologies have increased to a point where...
134
Voted
DAC
1997
ACM
15 years 8 months ago
1997
ACM
: Academic clock routing research results has often had limited impact on industry practice, since such practical considerations as hierarchical buffering, rise-time and overshoot ...