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ICCAD
2007
IEEE
14 years 6 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
ICCAD
2007
IEEE
14 years 6 months ago
2007
IEEE
— In order to reduce parasitic mismatch in analog circuits, some groups of devices are required to share a common centroid while being placed. Devices are split into smaller ones...
ICCAD
2007
IEEE
14 years 6 months ago
2007
IEEE
While circuit density and power efficiency increase with each major advance in IC technology, reliability with respect to soft errors tends to decrease. Current solutions to this...
3DIM
2007
IEEE
14 years 4 months ago
2007
IEEE
Modeling dynamic scenes is a challenging problem faced by applications such as digital content generation and motion analysis. Fast single-frame methods obtain sparse depth sample...
3DIM
2007
IEEE
14 years 4 months ago
2007
IEEE
We present fast and accurate segmentation algorithms of range images of urban scenes. The utilization of these algorithms is essential as a pre-processing step for a variety of ta...