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TCAD
2010
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13 years 6 months ago
Stress Aware Layout Optimization Leveraging Active Area Dependent Mobility Enhancement
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan
CONCURRENCY
1998
107views more  CONCURRENCY 1998»
13 years 11 months ago
CEV: collaborative environment for visualization using Java RMI
Collaborative visualization is an active area of research in computer science. Many di erent techniques and implementations have been proposed. However, most of today's syste...
Rajeev R. Raje, Michael Boyles, Shiaofen Fang