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    ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
    15 years 14 days ago
    ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction
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    In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...
    Minsik Cho, Kun Yuan, Yongchan Ban, David Z. Pan
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