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    ASPDAC
    2009
    ACM
    212views Hardware» more  ASPDAC 2009»
    Timing analysis and optimization implications of bimodal CD distribution in double patterning lithography
    14 years 6 months ago
    Timing analysis and optimization implications of bimodal CD distribution in double patterning lithography
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    Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
    Kwangok Jeong, Andrew B. Kahng
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