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ISPD
1998
ACM
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ISPD 1998
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Filling and slotting: analysis and algorithms
14 years 3 months ago
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www.cs.virginia.edu
In very deep-submicron VLSI, certain manufacturing steps – notably optical exposure, resist development and etch, chemical vapor deposition and chemical-mechanical polishing (CM...
Andrew B. Kahng, Gabriel Robins, Anish Singh, Huij...
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