Sciweavers

ISPD
2010
ACM
195views Hardware» more  ISPD 2010»
14 years 6 months ago
Density gradient minimization with coupling-constrained dummy fill for CMP control
In the nanometer IC design, dummy fill is often performed to improve layout pattern uniformity and the post-CMP quality. However, filling dummies might greatly increase intercon...
Huang-Yu Chen, Szu-Jui Chou, Yao-Wen Chang
DAC
2000
ACM
15 years 5 days ago
Practical iterated fill synthesis for CMP uniformity
We propose practical iterated methods for layout density control for CMP uniformity, based on linear programming, Monte-Carlo and greedy algorithms. We experimentally study the tr...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...