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ISPD
2010
ACM
195views Hardware» more  ISPD 2010»
14 years 6 months ago
Density gradient minimization with coupling-constrained dummy fill for CMP control
In the nanometer IC design, dummy fill is often performed to improve layout pattern uniformity and the post-CMP quality. However, filling dummies might greatly increase intercon...
Huang-Yu Chen, Szu-Jui Chou, Yao-Wen Chang
DAC
2000
ACM
15 years 13 days ago
Practical iterated fill synthesis for CMP uniformity
We propose practical iterated methods for layout density control for CMP uniformity, based on linear programming, Monte-Carlo and greedy algorithms. We experimentally study the tr...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...