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36
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ISPD
2010
ACM
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ISPD 2010
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A matching based decomposer for double patterning lithography
14 years 3 months ago
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home.eng.iastate.edu
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Yue Xu, Chris Chu
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