ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
Designing high-performance low-power register files is of critical importance to the continuation of current performance advances in wide-issue and deeply-pipelined superscalar m...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
— Y -interconnects for VLSI chips are based on the use of global and semi-global wiring in only 0◦ , 60◦ , and 120◦ . Though X-interconnects are fast replacing the traditio...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
In this paper, we propose and implement a vector processing system that includes two identical vector microprocessors embedded in two FPGA chips. Each vector microprocessor suppor...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
Formal verification has become an important step in circuit and system design. A prominent technique is Bounded Model Checking (BMC) which is widely used in industry. In BMC it i...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
As power consumption of the clock tree dominates over 40% of the total power in modern high performance VLSI designs, measures must be taken to keep it under control. One of the m...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
Although RTL power macromodeling is a mature research topic, it is not yet broadly accepted in the industrial environment. One of the main reasons impairing its widespread use as ...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
In sub-90nm technologies, more frequent hard faults pose a serious burden on processor design and yield control. In addition to manufacturing-time chip repair schemes, microarchit...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
Performance, power, and functionality, yield and manufacturability are rapidly becoming additional critical factors that must be considered at higher levels of ion. A possible sol...
ISVLSI
2007
IEEE
14 years 5 months ago
2007
IEEE
As technology scales, more sophisticated fabrication processes cause variations in many different parameters in the device. These variations could severely affect the performance ...