Sciweavers

ICCAD
2007
IEEE
111views Hardware» more  ICCAD 2007»
15 years 1 days ago
Exploiting STI stress for performance
— Starting at the 65nm node, stress engineering to improve performance of transistors has been a major industry focus. An intrinsic stress source – shallow trench isolation –...
Andrew B. Kahng, Puneet Sharma, Rasit Onur Topalog...