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32
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ICCD
2007
IEEE
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ICCD 2007
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On modeling impact of sub-wavelength lithography on transistors
14 years 8 months ago
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www-unix.ecs.umass.edu
As the VLSI technology marches beyond 65 and 45nm process technologies, variation in gate length has a direct impact on leakage and performance of CMOS transistors. Due to sub-wav...
Aswin Sreedhar, Sandip Kundu
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