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TVLSI
2010
13 years 2 months ago
SRAM Read/Write Margin Enhancements Using FinFETs
Process-induced variations and sub-threshold leakage in bulk-Si technology limit the scaling of SRAM into sub-32 nm nodes. New device architectures are being considered to improve ...
Andrew Carlson, Zheng Guo, Sriram Balasubramanian,...