A one-shot projection method for interconnects with process variations

—With the development of IC technology, it becomes urgent to investigate model reduction method for interconnects with process variations. In this paper, a one-shot projection algorithm (OPM) is proposed to generate a projection matrix that is independent of statistically varying parameters. As a result, construction of the reduced system can be decoupled with the Monte Carlo analysis in either frequency domain or time domain. Therefore, without loss of accuracy, OPM can obtain a reduced system in much less CPU time compared with the previous perturbation scheme. Numerical results have demonstrated the advantages of the proposed OPM.

• Type: Conference
• Year: 2006
• Where: ISCAS
• Authors: Jun Tao, Xuan Zeng, Fan Yang, Yangfeng Su, Lihong Feng, Wei Cai, Dian Zhou, Charles Chiang
• Keywords: ISCAS 2006, Model Reduction Method, Monte Carlo Analysis, One-shot Projection Algorithm