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DAGM
2004
Springer

Using Pattern Recognition for Self-Localization in Semiconductor Manufacturing Systems

14 years 5 months ago
Using Pattern Recognition for Self-Localization in Semiconductor Manufacturing Systems
In this paper we present a new method for self-localization on wafers using geometric hashing. The proposed technique is robust to image changes induced by process variations, as opposed to the traditional, correlation based methods. Moreover, it eliminates the need in training on reference patterns. Two enhancements are introduced to the basic geometric hashing scheme improving its performance and reliability: using quadtree for efficient data access and optimal rehashing for Bayesian voting. The approach proved to be highly reliable when tested on real wafer images.
Michael Lifshits, Roman Goldenberg, Ehud Rivlin, M
Added 01 Jul 2010
Updated 01 Jul 2010
Type Conference
Year 2004
Where DAGM
Authors Michael Lifshits, Roman Goldenberg, Ehud Rivlin, Michael Rudzsky
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