This paper argues that the existing approaches to modeling and characterization of IC malfunctions are inadequate for test and yield learning of Deep Sub-Micron (DSM) products. Traditional notions of a spot defect and local and global process variations are analyzed and their shortcomings are exposed. A detailed taxonomy of process-induced deformations of DSM IC structures, enabling modeling and characterization of IC malfunctions, is proposed. The blueprint of a roadmap enabling such a characterization is suggested.
Wojciech Maly, Anne E. Gattiker, Thomas Zanon, Tho