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ISCAS
2008
IEEE

A nano-CMOS process variation induced read failure tolerant SRAM cell

14 years 5 months ago
A nano-CMOS process variation induced read failure tolerant SRAM cell
— In a nanoscale technology, memory bits are highly susceptible to process variation induced read/write failures. To address the above problem, in this paper a new memory cell is proposed which is highly stable against nanoscale process variations as well as power efficient. The effectiveness of the proposed cell is exhaustively evaluated through detailed Monte Carlo simulations. It is observed that the 16% variation in threshold voltage results in negligible effects on Static Noise Margin (SNM) during read operation. Experiments under different loading conditions indicate that there is reduction 2X (approximately) in power dissipation and 2X (approximately) in leakage.
Jawar Singh, Jimson Mathew, Saraju P. Mohanty, Dhi
Added 31 May 2010
Updated 31 May 2010
Type Conference
Year 2008
Where ISCAS
Authors Jawar Singh, Jimson Mathew, Saraju P. Mohanty, Dhiraj K. Pradhan
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